发明名称 |
LASER INDUCED DRY CHEMICAL ETCHING OF METALS |
摘要 |
Disclosed is a method of etching a metallized substrate by laser radiation. The substrate is exposed to a selected gas which spontaneously reacts with the metal forming a solid reaction product with the metal by a partial consumption of the metal. A beam of radiation of a wavelength suitable for absorption by the reaction product and/or by the metal thereunder is applied in a desired pattern to vaporize the reaction product and thereby selectively etch the metal. |
申请公布号 |
DE3474044(D1) |
申请公布日期 |
1988.10.20 |
申请号 |
DE19843474044 |
申请日期 |
1984.12.11 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHEN, LEE;CHUANG, TUNG JUNG;MATHAD, GANGADHARA SWAMI |
分类号 |
B41M5/26;C04B41/91;C23F4/02;H05K3/02;(IPC1-7):C23F4/02;B23K26/18 |
主分类号 |
B41M5/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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