发明名称 DOUBLE BUFFER VACUUM SYSTEM
摘要 It is provided as shown in the drawings with a high vacuum inner chamber (4), a rough vacuum outer chamber (6, 8), first and second rough vacuum pumps (62, 76), high vacuum pump (70), and first and second vacuum gauges (46, 82), and is adapted to use in the equipment requiring the high, or ultrahigh vacuum. Particularly, this is able to facilitate manufacturing, to cut down expenses of high vacuum materials for the chamber wall, and to minimize the vacuum leakage because the high vacuum inner chamber (4) itself and all of the high vacuum components connected thereto is disposed hermetically in the rough vacuum outer chamber (6, 8) which is exposed directly to the atmosphere.
申请公布号 WO8808044(A1) 申请公布日期 1988.10.20
申请号 WO1988KR00008 申请日期 1988.04.16
申请人 LEE, HYEONG, GON 发明人 LEE, HYEONG, GON
分类号 C23C14/56;H01L21/00;(IPC1-7):C23C14/24 主分类号 C23C14/56
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