| 摘要 |
<p>PURPOSE:To solve the problem of a granular structure without having a columnar structure like a metallic film which is formed with a spatter vaporization technique by preparing heavy metal compounds with a plasma excitation CVD technique. CONSTITUTION:A substrate 2 is attached to a heater 3 and various gases are introduced from a lower electrode side to a reaction chamber, while the amount of outflowing gases which are supplied by gas cylinders 6-8 is being controlled by mask flow controllers 51-53. Further, the high frequency output having frequencies 13.56 MHz is supplied from a RF power source part 1 to a lower electrode and its electric field is impressed. Then, an X-rays absorber is held on the substrate 2, while its absorber is mainly composed of heavy metals which prevent transmission of the X-rays and is also patterned. This feature makes it possible to prepare an X-rays mask equipped with an X-rays transmission film having transmissivity to the X-rays as well as a housing to support its transmission film. Gases which are principally composed of hydrogen, boron, carbon, nitrogen, oxygen, silicon, and phosphorus and a gas containing tungsten or tantalum are used.</p> |
