| 摘要 |
PURPOSE:To obtain good C/N at the time of high-density recording and reproducing by sputtering vapor deposition under magnetron discharge at a higher speed by providing spherical ruggedness to a target at the time of forming a thin ferromagnetic metallic film by magnetron sputtering vapor deposition. CONSTITUTION:The target 14 is formed of an alloy target 14-1 disposed with spherical projections on the surface or 14-2 constituted by coating and fixing particles 20 to a nonmagnetic sheet 19 and disposing a ferromagnetic alloy layer 21 thereon. More specifically, the target 14 having the spherical ruggedness is used at the time of forming the above-mentioned film by magnetron sputtering vapor deposition on the moving substrate 10. The intensity of leakage magnetic fluxes is thereby modulated and the thin ferromagnetic metallic film formed by the sputtering vapor deposition is constituted of the finer columnar particles. Noises are suppressed and the good C/N is obtd.
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