| 摘要 |
PURPOSE:To form a resist pattern with an accuracy higher than that achieved by a screen printing method, by applying an active energy ray-curable resist ink to a copper-clad laminate polished to a specified surface roughness by dry offset printing, and irradiating the applied ink with active energy rays. CONSTITUTION:A copper-clad laminate is polished to a center line average roughness according to JIS B0601 (surface roughness) of at most 0.25mum, preferably, at most 0.20mum and a maximum height of a sampled part of at most 3.0mum, preferably, at most 2.0mum. With the polishing it is possible to form an etching resist pattern free of pinholes or the like by a dry offset printing method. An active energy ray-curable resist ink is preferably an ink capable of being cured by irradiation with active energy rays such as UV rays and electron rays. |
