发明名称 ALIGNMENT CORRECTION SYSTEM
摘要 PURPOSE:To quickly and highly accurately execute a correction operation to position each prescribed region during a plate-making process according to a global alignment system by a method wherein a distance between marks formed on a plane object according to a previously designed value is measured accurately prior to a stepping shift operation and this measured result is compared with the designed value of the distance between said marks and is operated. CONSTITUTION:After a large-sized substrate 1 has been aligned by using marks 3 for global alignment use, a plate-making operation in a prescribed region of the large- sized substrate 1 is executed during a stepping shift operation. During this process, a distance between marks 2 for distance measurement use in the longitudinal direction and in the transverse direction is measured accurately by using, e.g., a laser interferometer or the like prior to the stepping shift operation (process S1). Then, said measured value is compared with a designed value of the distance between the marks 2 and is operated; the expansion of the large-sized substrate 1 is calculated; an appropriate amount to be corrected for positioning said prescribed region is calculated (process S2). A correction is executed during the stepping shift operation on the basis of said amount to be corrected (process S3). Afterward, said processes S1-S3 are repeated at each stepping shift operation.
申请公布号 JPS63250120(A) 申请公布日期 1988.10.18
申请号 JP19870085307 申请日期 1987.04.07
申请人 MITSUBISHI ELECTRIC CORP 发明人 MAEJIMA TARO;AOKI OSAMU;TERASONO TAKESHI
分类号 H01L21/68;G03F9/00;H01L21/027;H01L21/30 主分类号 H01L21/68
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