| 摘要 |
PURPOSE:To make the thickness of a coating film uniform by a method wherein a resist temperature adjuster is provided to slightly raise the temperature of resist immediately before it is dripped corresponding to the temperature of wafer chuck. CONSTITUTION:A resist temperature controller 10 whereto temperature data for wafer chuck are inputted from a chuck temperature sensor 8 transmits control signals conforming to the data to slightly raise the temperature of resist solution 6 higher than the temperature of wafer chuck to a resist temperature adjuster 9. As soon as the relation between temperatures of dripping resist solution 6 and a wafer 5 is properly adjusted, the resist solution 6 is dripped on the wafer 5 to be diffusion-coated. Thus, the evaporation of solvent is made almost constant to almost equalize the viscosity of resist solution for the whole term of coating process. Through these procedures, a coating film of resist solution 6 to be extended by centrifugal force can be formed to be uniform as a whole.
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