发明名称 CONTROL SYSTEM FOR ETCHING
摘要 PURPOSE:To permit automatic etching operation under adequate and specified conditions by detecting the degree of fatigue of the etching soln. for which a spray etching device is used and controlling the time for etching according to the degree of fatigue of the liquid. CONSTITUTION:The etching liquid is sampled in a cell part 15 via a tube 2 by a roller pump 3 at the time of subjecting a substrate material 9 to spray etching in the etching device 1. Light is projected from a light source 11 of a spectrophotometer 4 through a slit 14 to this etching soln. and the transmission rate thereof is applied as a reception signal to a detector 12 from a photodetector. The signal is subjected to data processing by a CPU 5 or 13 by which the degree of fatigue of the etching soln. is automatically processed. The number of revolutions of a motor in a roller conveying part is then changed by an A/D converter 6. The automatic etching operation to produce parts having good working accuracy is thereby permitted.
申请公布号 JPS63250473(A) 申请公布日期 1988.10.18
申请号 JP19870085377 申请日期 1987.04.07
申请人 SEIKO INSTR & ELECTRONICS LTD 发明人 NAKASONE KAZUHISA
分类号 C23F1/00 主分类号 C23F1/00
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