发明名称 IMPURITY BAND CONDUCTION SEMICONDUCTOR DEVICES
摘要 <p>A semiconductor diode is designed to operate at a temperature where the thermal generation of free charge carriers is negliglble. The diode includes a first semiconducting layer with a sufficient concentration of first conductivity type impurities to exhibit metallic type conductivity, a second semiconducting layer with a sufficient first conductivity type concentration to create an impurity energy band and with a second conductivity type impurity concentration less than half the first, and a blocking layer between the first and second layers with a sufficiently low impurity concentration that substantially no charge transport can occur by an impurity conduction mechanism. First and second ohmic contacts are deposited on the first and second layers opposite the blocking layer. The same types of layers are used to construct transistors.</p>
申请公布号 CA1243388(A) 申请公布日期 1988.10.18
申请号 CA19840463121 申请日期 1984.09.13
申请人 ROCKWELL INTERNATIONAL CORPORATION 发明人 STAPELBROEK, MARYN G.;PETROFF, MICHAEL D.
分类号 H01L29/73;H01L21/331;H01L29/36;H01L29/68;H01L29/76;H01L29/86;H01L29/861;H01L29/88;H01L31/068;H01L31/10;H01L31/105;H01L31/11;(IPC1-7):H01L31/02 主分类号 H01L29/73
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