| 摘要 |
PURPOSE:To enable larger plasma to be generated, by providing a reaction chamber at the distal end of a waveguide, the reaction chamber having a specific construction capable of increasing plasma sufficiently. CONSTITUTION:A vacuum vessel 8 for generating plasma is provided at the tip end of a waveguide 1 guiding plasma generating microwaves, and a reaction chamber 9 having therein a tapered guide 5 for gradually enlarging the electric field of microwaves is provided within the vacuum vessel 8. Within the reaction chamber 9, there is arranged a table 10 for holding a substrate and there is also provided a resonance plate 11 for causing plasma to be generated efficiently on the substrate. The resonance plate has fan adjuster 12 so that it can be adjusted in the direction along which microwaves advance. In this manner, it is possible to generate plasma of a size of phi100-200 mm.
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