| 摘要 |
A solar cell fabrication procedure which is characterized by (a) forming a front surface mask (12) in the configuration of the front surface electrodes, (b) a passivation step which, inter alia, results in the formation of an altered silicon substrate surface layer (18) in the areas not covered by the front surface mask, (c) removal of the front surface mask (12), and (d) the use of the altered surface layer (18) as a plating mask for subsequent metallization steps. |
