发明名称 MANUFACTURE OF PHOTOSENSOR
摘要 PURPOSE:To increase the gamma-value without decreasing the light response speed, by radiating a light more than or equal to a specified amount, whose wavelength is shorter than the threshold wavelength in the longer wavelength side with respect to the absorption-end wavelength, on a photo sensor at a high temperature after a protective film is formed. CONSTITUTION:A thin film mainly composed of CdS, CdSe or these solid solution CdS-CdSe is formed on an insulative substrate. This thin film is exposed to the vapor of CdCl2 under a high temperature, and photo-electrically activated. Then facing electrodes are arranged, and a protective film is formed. After the protective film is formed, a photo-sensor is irradiated under a high temperature with a light more than or equal to a specified amount. The wavelength of said light is shorter than lambdaL which is a threshold wavelength of the longer wavelength side with respect to the absorption-end wavelength lambdaE. Thereby, the gamma-value can be increased, without deteriorating the merit that the photo current value of a photoconductive type photo-sensor is large, and without making the photo response speed of photo current slow.
申请公布号 JPS63249366(A) 申请公布日期 1988.10.17
申请号 JP19870083231 申请日期 1987.04.03
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 IKEDA KOSUKE;WADA HIROKO;YOSHIGAMI NOBORU
分类号 H01L27/146;H01L27/14;H01L31/0264;H01L31/08 主分类号 H01L27/146
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