| 摘要 |
PURPOSE:To prevent a device from damages, to improve the characteristics of the device, and to miniaturize the device, by forming metallic film or dielectric film with a photoresist splitable at a principal chain, using also an org. solvent for all treating liquid. CONSTITUTION:A high molecular compd. splitable at a principal chain which changes its dissolution velocity into an org. solvent when its principal chain is split is used as photoresist, and an org. solvent alone is used for the treating liquid at the same time. Suitable photoresist is polymethyl isopropenyl ketone. An org. solvent consisting primarily of methyl ethyl ketone, acetone, and xylene, is used as developing liquid. Xylene is used as rinsing liquid,and acetone is used as releasing agent for the resist. By this constitution, a metallic film pattern or dielectric film can be formed without causing damage of lithium tetraborate crystal. Thus, devices such as surface acoustic wave element, etc. can be made to have high performance, and suitability for high frequency. Miniaturization of the device is also possible. |
