| 摘要 |
PURPOSE:To enable a substrate having a larger area to be treated and to improve productivity, by providing microwave reflection plates for radiating microwaves efficiently, within a vacuum bell-jar for receiving the substrate. CONSTITUTION:A microwave plasma CVD system of the present invention comprises a large microwave sealed chamber 5 within which a vacuum bell-jar 6 for receiving a substrate 8 to be treated is provided. Within the bell-jar 6, there are provided microwave reflection plates 7 for radiating microwaves efficiently. The microwave reflection plates 7 can be regulated with respect to its angle, position or the like such that diffused microwaves are concentrated to the bell-jar 6, whereby the electric field of microwaves within the bell-jar 6 can be controlled properly. Accordingly, it is possible to generate larger plasma 10, which enables a substrate having a larger area to be treated, Therefore, the productivity is improved.
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