| 摘要 |
PURPOSE:To form the title uniform thin film with less defects by using a substrate in contact with a pure water at the contact angle theta>=80 deg., and forming thin film spread over the water surface on the substrate. CONSTITUTION:The thin film is formed on the hydrophobic substrate 1 in contact with pure water 4 at the contact angle of theta>=80 deg.. Accordingly, the thin film combines with the substrate 1 by the van der Waals force, and the water causing defects are practically excluded. The contact angle is more preferably controlled to 90-130 deg.. The substrate 1 having hydrophobicity imparted by a silane coupling agent is used, the substrate 1 is moved toward a vapor-liq. interface, and a first layer is formed on the substrate 1 by the Langmuir- Blodgett's technique. By this method, a uniform thin film with less defects can be formed.
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