| 摘要 |
PURPOSE:To prevent the deterioration of electrodes due to dissolution and exfoliation by an electrochemical reaction during wet photo working when different electrode materials are present on the same electrical element, by coating the lower electrode material with an insulating layer except the contact part. CONSTITUTION:An ITO electrode 2 is coated with an insulating layer 5 of SiO2 or the like and a contact hole (connection part) 7 is made at the contact part. An Al electrode 8 is deposited by vapor deposition or other method so as to coat the connection part 7 and a resist pattern 9 is formed on the electrode 8 by photolithography. The resulting device is immersed in an Al etchant to remove the unnecessary Al and to form a pattern Al electrode 8. At this time, a galvanic cell is not formed between both the electrodes 2, 8 because the ITO electrode 2 is coated with the Al electrode 8, so the deterioration of the electrodes 2, 8 due to the dissolution of the electrode 2 and the exfoliation between the electrodes 2, 8 by an electrochemical reaction can be prevented.
|
