发明名称 THIN FILM-TREATING EQUIPMENT
摘要 PURPOSE:To prevent the corrosion damage of electrodes, by specifying, as a material for electrodes disposed in a vacuum tank, the carbides of Si, Cr, etc., the borides of Ti, Zr, etc., the nitrides of Al, Ti, etc., the oxides of Al, Ca, etc., Ni, Al, etc. CONSTITUTION:This thin film-treating equipment is provided with a vacuum tank and both electrodes of cathode and anode for exciting electric discharge in the above vacuum tank. Both electrodes mentioned above are composed of <=5wt.% of one or more kinds among the nitrides of Al, Ti, Si, and B and/or the oxides of Al, Ca, Si, B, and Y, 0.5-5wt.% of one or more elements among Ni, Al and Ti, and the balance one or more kinds among the carbides of Si, Cr, Zr, Nb, Hf, Ti, and Ta and/or one or more kinds among the borides of Ti, Zr, Nb, Ta, and W.
申请公布号 JPS63247370(A) 申请公布日期 1988.10.14
申请号 JP19870079887 申请日期 1987.04.01
申请人 TOSHIBA CORP 发明人 SATO MICHIO;TAKEUCHI HIROSHI;KAGAMI HIDEYO
分类号 C04B41/87;C04B41/91;C23C16/50;C23C16/511;C23F4/00 主分类号 C04B41/87
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