| 摘要 |
PURPOSE:To realize a long life of a by a susceptor by a method wherein a recessed part for accommodation and support is shaped to be of the same size as a wafer and a stepped part to support the wafer by touching only a peripheral part of the wafer is formed at the circumference of the recessed part so that the support stand is etched little without deteriorating the flatness of the wafer. CONSTITUTION:A susceptor 10 used for vapor growth operation has at least one recessed part 11, on its flat plane, whose figure is similar to that of a water, a stepped part 12 which supports the wafer by touching only a peripheral part of the wafer is formed at the inner circumference of the recessed part 11. In addition, a hollow part 14 to produce a vacant space at the rear of the wafer during the accommodation is formed at the inner circumference side of the stepped part 12. By this setup, it is possible to prevent that a raw gas creeps into the vacant space at the rear of the wafer during a vapor growth process; it is also possible to prevent an etching operation at a gap at an orientation flat and a notch; it is possible to mount the orientation flat and the notch in the same position as in previous operations even during a continuous vapor growth process; the flatness of the wafer is deteriorated little.
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