发明名称 |
Exposure mask for materials coated with a photosensitive layer. |
摘要 |
Upper and lower exposure mask for double-sided, simultaneous and accurately fitting exposure of materials coated with a photosensitive layer, for example untreated conductor boards consisting in each case of a substrate material with photographic emulsions such as silver halide/gelatine or diazo layers, the substrate material consisting of chemically hardened glass. |
申请公布号 |
EP0286018(A2) |
申请公布日期 |
1988.10.12 |
申请号 |
EP19880105250 |
申请日期 |
1988.03.31 |
申请人 |
BASF AKTIENGESELLSCHAFT |
发明人 |
ECKLE, GEORGE ALBRECHT;KLINSMANN, UWE, DR. |
分类号 |
G03C1/76;G03F1/00;G03F1/54;G03F7/09;H01L21/027;H05K3/00 |
主分类号 |
G03C1/76 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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