High contrast, positive photoresist developer containing alkanolamine.

摘要

Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: <CHEM> wherein n is 0 or 1; m is 1 or 2; and each R<1> and R<2> is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R<2>'s are not both ethyl. The addition of this adjunct prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed, increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.