发明名称 PLASMA TREATMENT SYSTEM
摘要 PURPOSE:To execute a uniform plasma treatment even for a large-diameter substrate by a method wherein a permanent magnet is arranged at the circumference of a plasma generation part and at a place which is nearer to a substrate than to a solenoid coil and this permanent magnet is turned so that a plasma stream is turned. CONSTITUTION:A solenoid coil 7 to generate a plasma by making use of the electron cyclotron resonance is arranged at the circumference of a plasma generation part 1; a permanent magnet 14 is arranged at a place which is nearer to a substrate 3 than to the solenoid coil 7 and at the circumference at the plasma generation part 1; the permanent magnet 14 is turned at the circumference of the plasma generation part 1. If the permanent magnet 14 is turned, it is possible to generate a rotating magnetic field, to turn a plasma stream 11 together with this rotating magnetic field and to take out the plasma in a wide region. By this setup, it is possible to uniformly execute a plasma treatment for a large-diameter substrate.
申请公布号 JPS63244614(A) 申请公布日期 1988.10.12
申请号 JP19870077133 申请日期 1987.03.30
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKANISHI KOICHIRO;ODERA HIROKI;MINAMI TOSHIHIKO;HANAZAKI MINORU
分类号 H01L21/302;H01L21/205;H01L21/3065;H01L21/31 主分类号 H01L21/302
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