| 摘要 |
A method and apparatus are disclosed for the reactive vapor deposition of metal compounds onto a substrate. At least one metal is evaporated from an elongated evaporation crucible in an atmosphere consisting of a reaction gas at a pressure of no more than 10-1 mbar. The metal is evaporated by means of an electron beam having an acceleration voltage of at least 20 kv. The invention solves the problem of providing stable an repeatable operating conditions, even with an evaporation crucible of considerable length.
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