发明名称 |
FORMATION OF FLUORORESIN COATING FILM |
摘要 |
PURPOSE:To form a fluororesin coating film at a low temp. by subjecting a base material to vacuum plating with fluororesin having reduced mol.wt. as a target material. CONSTITUTION:Low mol.wt. fluororesin which is easily depolymerized or evaporated at a low temp. is prepd. A base material is subjected to vacuum plating such as vacuum deposition, sputtering or ion plating with the fluororesin as a target material. The fluororesin is deposited on the desired part of the base material to form a film.
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申请公布号 |
JPS63243262(A) |
申请公布日期 |
1988.10.11 |
申请号 |
JP19870075977 |
申请日期 |
1987.03.31 |
申请人 |
CENTRAL GLASS CO LTD |
发明人 |
ARAMAKI MINORU;KUBO MASAHIRO;NAKANO HISAHARU;KURASHIGE HIROYUKI |
分类号 |
C23C14/12;B05D7/24;C23C14/34 |
主分类号 |
C23C14/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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