发明名称 FORMATION OF FLUORORESIN COATING FILM
摘要 PURPOSE:To form a fluororesin coating film at a low temp. by subjecting a base material to vacuum plating with fluororesin having reduced mol.wt. as a target material. CONSTITUTION:Low mol.wt. fluororesin which is easily depolymerized or evaporated at a low temp. is prepd. A base material is subjected to vacuum plating such as vacuum deposition, sputtering or ion plating with the fluororesin as a target material. The fluororesin is deposited on the desired part of the base material to form a film.
申请公布号 JPS63243262(A) 申请公布日期 1988.10.11
申请号 JP19870075977 申请日期 1987.03.31
申请人 CENTRAL GLASS CO LTD 发明人 ARAMAKI MINORU;KUBO MASAHIRO;NAKANO HISAHARU;KURASHIGE HIROYUKI
分类号 C23C14/12;B05D7/24;C23C14/34 主分类号 C23C14/12
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