Method for improving emmissivity value of a pyrolytically applied film

摘要

This specification is directed to a method for improving emmissivity value of a pyrolytically applied doped tin oxide film on a surface of a glass substrate, such as a sheet of glass. The method includes the steps of heating the surface of the glass substrate to an initial temperature in a range from 560 DEG -650 DEG C. and thereafter applying to the surface of the glass substrate a doped tin oxide film by a pyrolytic decomposition process. The pyrolytic decomposition process is one which cools the surface of the glass substrate. The surface of the glass substrate is reheated to a temperature equal to or greater than the initial temperature but not in excess of 675 DEG C. Thereafter, a doped tin oxide film is applied to the previously coated surface of the glass substrate. The reheating and application steps may be repeated as many times as desired to produce a coated glass substrate having the desired coating thickness and emmissivity characteristics.