| 摘要 |
PURPOSE:To obtain a target for sputtering having a large area and satisfactory workability and used to form a magnetic thin film by using a casting having a compsn. represented by a prescribed formula and contg. a heavy rare earth metal and Fe as principal components, a light rare earth metal and one or more of Pd, Pt, Ag and Au. CONSTITUTION:This target for sputtering is a casting used to form a magnetic thin film of an alloy based on a heavy rare earth metal (HR) and Fe by sputtering and contains a light rare earth metal (LR) and one or more along Pd, Pt, Ag and Au. The atomic compsn. of the target is represented by the formula (where M is one or more among Pd, Pt, Ag and Au, A is elements including Fe and other than LR, HR and M, x=0.05-0.6, y=10-50 and z=0-15). The HR is selected among Ge, Tb and Dy and the LR among Ce, Pr, Nd and Sm.
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