| 摘要 |
A dielectrometry apparatus for measuring the dielectric properties of a material, the apparatus including a casing adapted to be at least partially implanted into the material, the casing having a cavity defined by an opening which is capable of receiving a portion of the material upon implantation, a first electrode disposed within the cavity to make electrical contact with the material upon implantation, a second electrode disposed within the cavity in a spaced-apart relationship to the first electrode, the first and second electrode being adapted to make electrical contact with the material upon implantation, whereby dielectric measurements can be taken of the material in the cavity, a porous spacer for defining a fixed distance between the first and second electrodes and adapted for saturation with the material upon implantation, and a selectively permeable cover disposed across the opening of the cavity for permitting migration of the material upon implantation while excluding fillers that could interfere with the dielectric measurements.
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