| 摘要 |
PURPOSE:To obtain a highly pure oxide and CVD films while shortening the operation cycle, by providing a hermetical chamber having a door, a gas inlet port, an evacuation port and a transfer device in front of an access port of a process tube. CONSTITUTION:A hermetical chamber 8 is provided in front of and in connection with an access port 2 of a process tube 1, so that a work 7 is inserted into or taken out of the tube via the chamber 8. The hermetical chamber 8 comprises a gate valve 9 for closing the access port 2, a door 11 for closing a work inlet/ outlet port 10, a gas inlet port 12, an evacuation port 13 and a transfer device 14 for taking the work 7 into or out of the tube 1. In operation, the gate valve 9 is opened, the transfer device 14 carries a boat into the tube 1 and the access port 2 is closed by the pedestal of the device 14. In this manner, the atmosphere in the tube 1 is not contaminated by outside air. Accordingly, a highly pure oxide and CVD films can be obtained and, further, the operation cycle can be shortened.
|
