| 摘要 |
PURPOSE:To obtain a transmission type grating for soft X-rays having a large aperture diameter, sufficient thickness of Au and excellent spectral characteristics by executing a holographic exposing method, reactive ion beam etching, Au electroplating and back etching to allow the peripheral part of a substrate to remain as a supporting frame. CONSTITUTION:SiO2 5 is interposed as an intermediate layer between a photoresist 6 and polyimide 4 by using the holographic exposing method so as to apply the section of a sufficient thickness and comb shape to Au 3 which is an absorption band. The fluoroform reactive ion etching or reactive ion beam etching is executed for patterning from the photoresist 6 to the SiO2 5 and the oxygen reactive ion etching or the like is executed for patterning from the SiO2 5 to the polyimide 4. The Au electroplating is executed with the polyimide pattern of the formed perpendicular side wall as a stencil for plating and the back etching is executed with the peripherals part of the substrate as the supporting frame in order to provide adequate tension to the prepd. Au transmission type grating pattern. The transmission type grating for soft X-rays having the large aperture and excellent spectral characteristics is thereby obtd.
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