| 摘要 |
<p>A method for fabricating a uniphase virtual electrode CCD uses only a single mask of different materials, portions (25A, 24, 25B) of which are selectively removed, for a series of ion implantation steps. In this way, there is achieved the desired potential profile for the four sections (I-IV) of each cell without any need for aligning masks between successive implantation steps.</p> |
