Device fabrication involving planarization.

摘要

Planarization of geometrically difficult device surfaces is accomplished utilizing a coating technique relying on relatively low viscosity materials. In particular, device processing is accomplished by including a step that produces a planar surface by coating a nonplanar surface with a material that has a viscosity of less than 1000 cp and which upon curing into a solid material undergoes a volume change of less than twenty percent.