| 摘要 |
PURPOSE:To improve the accuracy in dimensions of a resist shape, by providing a mechanism, which isolates a substrate to be treated from treating liquid until the treating liquid, which is jetted from a nozzle, is sprayed uniformly, and uniformly swelling and contracting the resist under development. CONSTITUTION:A substrate 3 to be treated is rotated by using radiation sensitive resist 4. Under this state, organic-solution based developing liquid and rinsing liquid are sprayed from a spraying and developing apparatus. In this apparatus, a mechanism, by which the substrate 3 to be treated is isolated from the treating liquid until the treating liquid is uniformly sprayed from a nozzle 6, is provided. For example, a screening plate 7 is provided in front of the rinsing liquid spraying nozzle 6 so that the plate 7 is opened and closed. The screening plate 7 is linked to a motor 8, which is driven by air or electricity. After the rinsing liquid is discharged, the screening plate 7 is closed so that the rinsing liquid does not hit the substrate 3 for the desired time. Then the screening plate 7 is opened by movement. The uniformly sprayed rinsing liquid is jetted on the substrate 3. |
