| 摘要 |
PURPOSE:To accurately deposit a thin film in a desired shape on a substrate in which different materials are patterned by radiating one of Cw laser light, pulse-modulated CW laser light or pulse laser light by altering one of the intensity, the scanning speed, the pulse width or the pulse repetition frequency of the laser light in response to the difference of the thermal conductivities of different type materials. CONSTITUTION:A laser CVD for depositing a thin film on an irradiated region by selectively radiating laser light 23 on a substrate formed of different type materials is used. The thin film is deposited linearly by relatively scanning the light 23 on the substrate 11. The light 23 employs at least one of CW laser light, pulse-modulated Cw laser light or pulse laser light, and is irradiated by altering the intensity, the scanning speed, the pulse width or the pulse repetition frequency of the light 23 in response to the difference of the thermal conductivities of the different type materials. Thus, various type thin films are accurately deposited in a desired shape on the substrate 11 in which various base materials having different thermal conductivities are mixed, and beam of high quality is directly subjected to a lithography.
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