发明名称 |
X-RAY MASK AND MANUFACTURE THEREOF |
摘要 |
PURPOSE:To improve exceedingly the mask pattern accuracy by causing a multilayered film reflecting mirror where thin films mainly consisting of heavy and light elements having the prescribed thicknesses are alternately laminated to be a reflecting part and by making a film where X-ray reflectance is lowered by changing the property of a multilayered film an absorption part. CONSTITUTION:A part 14 reflecting X-rays of a X-ray mask is a multilayered film reflecting mirror 14 where heavy and light element thin films having the prescribed thicknesses are alternately laminated and a part 13 which does not reflect the X-rays is a deteriorated film where an interface between two sorts of multilayers and a multilayered structure are so indistinct that the interference effect loses its function. Further, since the multilayered film 10 has a structure where tens of layers have been deposited, a narrow multilayered film pattern 10a is stably in existence on a substrate 1a. Thus the pattern accuracy and stability of the X-ray mask can be improved. |
申请公布号 |
JPS63237523(A) |
申请公布日期 |
1988.10.04 |
申请号 |
JP19870070446 |
申请日期 |
1987.03.26 |
申请人 |
NIPPON TELEGR & TELEPH CORP <NTT> |
发明人 |
ISHIHARA SUNAO;KINOSHITA HIROO;YOSHIHARA HIDEO;KITAYAMA TOYOKI;KANEKO TAKASHI;TAKEUCHI NOBUYUKI |
分类号 |
G03F1/00;G03F1/22;G03F1/24;H01L21/027;H01L21/30 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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