| 摘要 |
PURPOSE:To prevent the infiltration of the atmosphere into a vacuum system by increasing the gaseous N2 supply pressure to the pressurizing chamber and cooling chamber on both sides of a sealing roll chamber, and introducing gaseous N2 into the sealing roll chambers adjacent to both chambers at the time of evacuating the vacuum system including the vapor deposition chamber and sealing roll chamber, etc., of the vacuum deposition device. CONSTITUTION:The pressure control valves 34 and 35 for gaseous N2 are provided to the gaseous N2 supply pipes 32 and 33 for the pressurizing chamber 30 and cooling chamber 31 in the vacuum vapor deposition plating line, and gaseous N2 supply pipes 40 and 41 are furnished to the sealing roll chambers 38 and 39 adjacent to the pressurizing chamber 30 and cooling chamber 31. When the vacuum system including the vapor deposition chamber, the sealing roll chambers on both sides, etc., are evacuated prior to the start of the vapor deposition plating, the vapor deposition start signal is transmitted to a control unit 36, the pressure control valves 34, 35, 42 and 43 of the gaseous N2 supply pipes 32, 33, 40 and 41 are regulated by the command from the control unit 36 to supply high-pressure gaseous N2 to the pressurizing chamber 30 and cooling chamber 31, gaseous N2 is also supplied to the adjacent sealing roll chambers 38 and 39, and the infiltration of the atmosphere into the sealing roll chambers and vapor deposition chamber due to the negative pressure in the chambers 30, 31, 38 and 39 is prevented.
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