| 摘要 |
PURPOSE:To enable fine processing of a nonlinear optical device using high energy beams by using a specified material for a patternable nonlinear optical material. CONSTITUTION:A patternable material for a nonlinear optical device is expressed by the formula I, wherein R<1> and R<2> are H atom, etc.; Ar is aromatic group; X is halogen atom, etc.: J is a divalent joint group; (m) and (n) are positive integers; (p), (q), and (r) are zero or positive integers with the proviso that p+q+rnot equal to 0; Y is a group generated by eliminating one H atom from a compd. expressed by the formula II or III. In the formula II, Z<1> and Z<2> are N atom, etc.; X is alkyl group, etc.; (n) is zero or an integer 1-3; R<11> is H atom, etc. In the formula III, Z<11> is a group of atoms necessary for forming a five- or six-membered ring having a nitro group as substituent; Z<12> is a group of atoms necessary for forming a pyrrole ring which may be substituted or condensed to a ring. By this constitution, a nonlinear optical material of a desired size may be arranged on a substrate. |
