| 摘要 |
PURPOSE:To suppress the sensitization of the titled composition in the lapse of the time until developing after exposing by incorporating a compd. capable of generating an acid by irradiating an active light, a specified silylether compd. which decomposes by the acid and increases the solubility in a developer by the action of said acid, and a polyhydric alcohol in the titled composition. CONSTITUTION:The titled composition contains the compd. capable of generating the acid by irradiating the active light, the silylether compd. which is shown by formulae I, II or III, and decomposes by the acid, and increases the solubility in the developer by the action of said acid and 1-20wt.% of the polyhydric alcohol which has >=180 deg.C b.p. at a normal pressure, based on the weight basis of the total composition except a solvent. In the formula, R1 is a m-valent aliphatic or an aromatic hydrocarbon group, R2-R4 are each hydrogen atom or alkyl group, etc., R5 and R7 are each a bivalent aliphatic or an aromatic hydrocarbon group, R6 is alkyl or aryl group, etc., R8 is hydrogen atom, etc., (m) and (n) are each a positive interger, (a) and (b) are each 0 or 1. Thus, the sensitization of the titled composition is suppressed in the lapse of the time until developing after exposing. |
