| 摘要 |
PURPOSE:To improve the fine pattern forming capacity and heat resistance of a photoresist by using specified alkali-soluble novolak resin and a specified sensitizer. CONSTITUTION:The titled compsn. consists of alkali-soluble novolak resin and a sensitizer. The novolak resin is a product produced by condensing phenol components with formaldehyde. The phenol components are m-cresol, p-cresol and xylenol and the amt. of 3,5-xylenol is >=10mol.% of the total amt. of the phenol components. The sensitizer is o-naphthoquinonediazido-5-sulfonic ester of 2,3,4,4'-tetrahydroxybenzophenone having 2.0-3.5 average rate of esterification. |
