| 摘要 |
PURPOSE:To make possible a stable conveyance and to contrive the improvement of a cleaning effect by setting the number of stages to be arranged and a tension to be applied by a method wherein a pair of roller brushes is set as one group and the plural groups are arranged. CONSTITUTION:A pair of upper and lower roller brushes is set as one group, the plural groups are arranged along a semiconductor substrate conveying line and roller brushes 1a and 1b are each rotated in directions A and A' reverse to each other on the upper and lower sides. Moreover, each roller brush 1a, 1b, 2a, 2b, 3a, 3b, 4a and 4b is ready-changed its number of rotation even though their directions of rotation are set in the same. Accordingly, each roller brush slips on a wafer (semiconductor substrate) 6 due to a difference in the numbers of rotation between the roller brushes 1a and 1b and the roller brushes 2a and 2b to cleanse the wafer 6 and even in case the water is made to pass through between the roller brushes 3a and 3b and 4a and 4b, the wafer is similarly cleansed. On the other hand, pure water or cleaning chemicals is sprayed toward the wafer 6 through nozzles 5 for increasing a cleaning effect. Thereby, the cleaning effect can be improved.
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