POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PURPOSE:To improve the fine pattern forming capacity and heat resistance of a photoresist by using specified alkali-soluble novolak resin. CONSTITUTION:The titled compsn. consists of alkali-soluble novolak resin and a sensitizer. The novolak resin is a product produced by condensing phenol components with formaldehyde. The phenol components are m-cresol, p-cresol and xylenol and the amt. of 3,5-xylenol is >=10mol.% of the total amt. of the phenol components. A quinoneazido compd. may be used as the sensitizer. When the compsn. is used, a fine resist pattern can be formed with high dimensional accuracy without narrowing the line width and the heat resistance of the resist is improved.