发明名称 PROCESS AND APPARATUS FOR PRODUCING SINGLE CRYSTAL OF COMPOUND SEMICONDUCTOR
摘要 PURPOSE:To prepare easily a uniform single crystal contg. scarcely crystal defect by dividing a crucible vessel and cooling a single crystal separated from the vessel when the single crystal grown by the Bridgman method attains wholly a solidified state. CONSTITUTION:A seed crystal 1 is charged to a receiver 3'' at the bottom of a crucible vessel 3 and a GaAs polycrystal as a starting material is mounted thereon. The vessel 3 is introduced into a chamber 7 and heated with a heating device 4 so as to maintain the temp. of a section housing the seed crystal 1 at a lower temp. and the temp. of a section housing the starting material at a higher temp. than the temp. of the seed crystal housing section. Thus, the GaAs polycrystal alone is melted to melt 2, and a procedure for growing a single crystal is executed by moving the vessel 3 or the heating device 4 relatively. When the growth of the single crystal 2 is completed in the vessel 3 and the whole of the single crystal 2 is solidified after beginning a cooling procedure, an upper dividable vessel 3' is divided to separate the solidified single crystal 2 from the inside wall of the upper dividable vessel, and the single crystal is taken out after cooling to RT. By this method, a single crystal 2 of a compound semiconductor having a uniform structure over the whole body of the single crystal contg. scarce crystal defect is prepd. easily.
申请公布号 JPS63233091(A) 申请公布日期 1988.09.28
申请号 JP19870067299 申请日期 1987.03.20
申请人 HITACHI CABLE LTD 发明人 MIZUNIWA SEIJI;AOYAMA MASAYOSHI
分类号 C30B11/00;C30B11/02 主分类号 C30B11/00
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