| 摘要 |
PURPOSE:To prevent the accumulation of a part of liq. and falling of the liq. as droplets by forming the end in the liq. splashing direction into a knife-edge shape at the part opposed to a liq. injection port and forming a reflecting surface. CONSTITUTION:The part 16 opposed to the liq. injection port 15a and forming the reflecting surface 16a is provided, and the liq. injected from the injection port 15a is allowed to collide with the reflecting surface 16a and splashed in the specified direction. The end 16b of the opposed part 16 in the liq. splashing direction is formed into a knife-edge shape. The accumulation of a part of liq. and falling of the liq. as droplets can be prevented by this spray nozzle. The spray nozzle can be appropriately utilized especially for spraying the liq. developer of a developing device for developing the photosensitive film formed on the surface of a semiconductor wafer.
|
