| 摘要 |
PURPOSE:To steadily form a functional deposited film with high efficiency by arranging a means for heating a cylindrical base body on which the deposited film is to be formed on the outside of the cylindrical base body and at a position other than a plasma producing region. CONSTITUTION:An external heater 14 is fixed on one side of the base body 7 across from the plasma producing region 13, and a reflecting plate 15 is provided. The inside of a vacuum vessel 1 is evacuated through an exhaust pipe 5, the base body 7 is heated by the heater 14, a raw gas is injected into the vacuum vessel 1 through a supply pipe, a microwave 4 is introduced into the vessel 1 through a waveguide 3, etc., and a deposited film is formed on the surface of the base body 7. In this case, since the reflecting plate 15 is provided, the base body 7 can be effectively heated by the heater 14, the substrate reaction of an active atom on the outside of the region 13 is promoted, and the quality of the deposited film can be improved. |
