发明名称 Power hemt structure
摘要 A modulation-doped field effect transistor comprises a gate recess through a top insulating layer, having a cross-section in a semiconductor layer increasing down to an interface with a further semiconductor layer and thereafter having a cross-section in the further semiconductor layer decreasing down to the bottom of the recess in the further semiconductor layer. A gate electrode is formed in the recess.
申请公布号 US4774555(A) 申请公布日期 1988.09.27
申请号 US19870083751 申请日期 1987.08.07
申请人 SIEMENS CORPORATE RESEARCH AND SUPPORT, INC. 发明人 KOHN, ERHARD;SCHNEIDER, MARK E.;WU, CHIA-JEN
分类号 H01L29/812;H01L21/285;H01L21/306;H01L21/335;H01L21/338;H01L29/423;H01L29/778;(IPC1-7):H01L29/80;H01L29/56 主分类号 H01L29/812
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