发明名称 SPUTTERING TARGET
摘要 PURPOSE:To improve the utilization efficiency of a material by flatly combining the plural target pieces consisting of the same material to form a sputtering target to exchange only the piece at the place with many thinned parts for a fresh one. CONSTITUTION:The sputtering target 5 is formed by a central discoid target piece 6 and the annular target piece 7 engaged on the outer edge of the piece 6, and both pieces 6 and 7 are produced by press-forming the same powdery material. At this time, the relative density of the discoid target piece 6 is made higher than that of the annular target piece 7, the porosity of the piece 6 is made lower than that of the piece 7, and the cooling efficiency of the discoid target piece 6 is made higher than that of the piece 7 when the target is fixed to a cooling plate 2 by a molten metal 3. When the target 5 is sputtered, only the specified part of the discoid target piece 6 is annularly damaged to a specified width, hence only the discoid target piece is exchanged for a fresh one, and the annular target piece 7 can be reused.
申请公布号 JPS63230870(A) 申请公布日期 1988.09.27
申请号 JP19870067126 申请日期 1987.03.20
申请人 MITSUBISHI METAL CORP 发明人 FUKUSHIMA MASATOSHI;FUKUI SOICHI
分类号 C23C14/34 主分类号 C23C14/34
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