| 摘要 |
PURPOSE:To form an undamaged excellent insulating film on a body to be vapor-deposited by using an insulator to electrically insulating the body from a holder supporting the body in the title thin film forming device utilizing an ion. CONSTITUTION:The vapor deposition material 2 in a crucible 1 is heated and melted by a bombard filament 5, and the vaporized electrons are injected from a nozzle 3 to form a cluster 4. The cluster 4 is ionized by the thermoelectron from an ionization filament 8. The ionized cluster is accelerated and controlled by an electric field, and an insulating film 15 is formed on the surface of a substrate 14 as the body to be vapor-deposited. At this time, the insulator 22 is provided between the conductive substrate 14 and the holder 20 supporting the substrate. Consequently, even when the ion is charged up on the insulating film 15 of the substrate 14, the electric charge is grounded through the substrate 14. As a result, electric breakdown is not caused on the formed insulating film 15.
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