| 摘要 |
PURPOSE:To improve a throughput by making an exposure shot for main patterns and a pattern for discrimination at the same time without making exposure shots for the main pattern and patterns for discrimination individually. CONSTITUTION:When plural main patterns which are sectioned from one another are exposed by making an exposure shot for a similar pattern on a large-sized substrate in order, the patterns for discrimination are arranged within an effective exposure range which can be exposed by one exposure shot, and the large- sized substrate is exposed to the patterns for discrimination at the same time together with the main patterns by respective exposure shots. For example, the large-sized substrate 14 is installed on an XY stage 15 and then moved and positioned at a 1st shot position. In this state, a main pattern A set at a reticle 11 and a discrimination pattern (B-1) printed on a film 18 for discrimination are exposed by a lighting optical system 12 through a projecting optical system 13. The main pattern A and discrimination pattern (B-1) corresponding to it are exposed by the exposure shot at the same time to the 1st shot position of the large-sized substrate 14 through said operation. Consequently, the throughput is improved. |
