发明名称 FORMATION OF FILM BY SPUTTERING
摘要 PURPOSE:To make the thickness and compsn. of a film uniform by arranging chemically different plural unit targets to form a rod target for sputtering, relatively rotating the target at the center of a tubular base materials in the axial center and carrying out sputtering. CONSTITUTION:A rod target 5 for sputtering is formed by arranging chemically different plural unit targets 5a, 5b in the longitudinal direction so that they are insulated from each other. While the target 5 is relatively rotated at the center of a tubular base material 4 in the axial center, sputtering is carried out to form a film on the inside of the base material 4.
申请公布号 JPS63227773(A) 申请公布日期 1988.09.22
申请号 JP19870059890 申请日期 1987.03.14
申请人 KOBE STEEL LTD 发明人 MAEDA YASUSHI;KUMAKIRI TADASHI;AKARI KOUICHIROU;MUNEMASA ATSUSHI
分类号 C23C14/34 主分类号 C23C14/34
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