发明名称 PUMPING SYSTEM FOR RF EXCITED GAS DEVICES
摘要 <p>An RF excited gas discharge laser (10) is operated by an RF exciting power supply (12, 14) having a frequency established at the selected pumping frequency of the laser. This pumping frequency is displaced from the resonant frequency of the laser itself and is provided via an impedance matching circuit (16) from the output of a high power amplifier (14) to which is fed the relatively low power output of the RF oscillator (12) of the power supply. The required starting voltage, of magnitude greater than the magnitude of the laser running voltage, is provided to ignite the laser by momentarily shifting the frequency of the RF oscillator to a frequency substantially the same as the resonant frequency of the laser and shifting the oscillator frequency back to its normal pumping frequency after laser ignition.</p>
申请公布号 WO1988007273(A1) 申请公布日期 1988.09.22
申请号 US1988000258 申请日期 1988.02.01
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