| 摘要 |
<p>A high-frequency ion source produces ion beams of large surface area and high current strength, of any desired cross-sectional shape, e.g. ribbon-shaped, from any desired type of ions. In a tubular plasma vessel (1) of the same shape as the desired shape of the ion beam clamped between a supporting plate and a covering plate, a plasma excitation can be achieved at low gas pressure by electron cyclotron wave resonance, an adjustable intermediate circuit (5) is arranged between the high-frequency generator (4) and the load circuit winding (2), a uniform magnetic field (Bo) required for the type of plasma generation employed is produced with a pair of Helmholtz coils whose geometry matches the shape of the plasma vessel, and a multi-electrode, ion-optical system for the extraction of ions adapted to the geometry of the desired ion beam is arranged on the supporting plate. The electrodeless production of plasma in a vessel of simple design makes it possible to produce an ion beam of high purity and hence high intensity, in particular for surface and thin-layer technology.</p> |
