DEVICE FOR FORMING THIN FILM

摘要

PURPOSE:To continuously and stably form a thin film for a long time by connecting a vacuum waveguide having a microwave introducing window in a direction perpendicular to magnetic flux in a plasma generation chamber. CONSTITUTION:One end of a vacuum waveguide 10 is linked to a microwave guide 7 with a microwave introducing window 6 in-between and the other end is connected to a plasma 3 generation chamber 11 so that it is made parallel to the side wall of the chamber 11 and perpendicular to magnetic flux generated by electromagnets 8 and diffusing toward a substrate 2 holder. The diameter and length of the chamber 11 are regulated so as to form a microwave cavity resonator for the resonance of microwaves introduced into a vacuum vessel 4, plasma 3 is generated by microwave discharge caused by electron cyclotron resonance and the generated plasma 3 is accelerated toward a substrate 2 by the gradient of a magnetic field. By this structure, the plasma 3 does not diffuse in a direction perpendicular to the magnetic flux, so the exposure of the window 6 to the plasma 3 is prevented to suppress the contamination of the window 6 and continuous stable film formation for a long time and efficient film formation at low temp. under low pressure of gas can be attained.